The Bureau of Industry and Security has determined that anisotropic plasma dry etching equipment controlled for national security reasons under Export Control Classification Number 3B001.c is available in China in sufficient quantities and quality to render U.S. export controls on this equipment ineffective. This equipment is used in the process for producing dual-use semiconductor devices such as flash memories, microwave monolithic integrated circuits, transistors and analog-to-digital-converters, which are used in civil and military applications such as radars, point-to-point radio communications, microprocessors, cellular infrastructure and satellite communications.

BIS conducts foreign availability assessments to examine and evaluate the effectiveness of U.S. export controls on certain items controlled for national security reasons under the Export Administration Regulations. In light of this foreign availability determination, BIS has provided to the State Department a proposal to remove the 3.B.1.c control on the equipment at issue from the dual-use list maintained by the Wassenaar Arrangement on Export Controls for Conventional Arms and Dual-Use Goods and Technologies.

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